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Photopolymer Reagents

 A photopolymer is a photosensitive, optically functional polymer material or resin whose properties, such as solubility, are altered by light irradiation. Photopolymers are widely used as photoresist materials during etching in the manufacture of printed circuits and semiconductor integrated circuits. In positive-type photoresist, photoacid generators (PAG) change the solubility of the photopolymer, whereas negative-type photoresist requires photopolymerization initiators for polymerization and curing. This section includes the monomers required to generate photopolymers.
 Please also check Photopolymerization initiators.

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Product Number A1551
CAS RN 2628-16-2
Purity / Analysis Method: >98.0%(GC)

Product Number A2859
CAS RN 216581-76-9
Purity / Analysis Method: >98.0%(GC)

Product Number A1389
CAS RN 1663-39-4
Purity / Analysis Method: >98.0%(GC)

Product Number M3223
CAS RN 249562-06-9
Purity / Analysis Method: >98.0%(GC)

Product Number A1735
CAS RN 121601-93-2
Purity / Analysis Method: >98.0%(GC)

Product Number:   A1551 | Purity / Analysis Method:   >98.0%(GC)

Product Number:   A2859 | Purity / Analysis Method:   >98.0%(GC)

Product Number:   A1389 | Purity / Analysis Method:   >98.0%(GC)

Product Number:   M3223 | Purity / Analysis Method:   >98.0%(GC)

Product Number:   A1735 | Purity / Analysis Method:   >98.0%(GC)